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Controlled growth of Cu2O thin films by electrodeposition approach
Affiliation:1. Qatar Environment and Energy Research Institute, Hamad Bin Khalifa University, Education City, Qatar Foundation, PO Box 5825, Doha, Qatar;2. College of Science and Engineering, Hamad Bin Khalifa University, Education City, Qatar Foundation, PO Box 5825, Doha, Qatar;3. Gas Processing Center, Qatar University, PO Box 2713, Doha, Qatar;1. School of Materials Science and Engineering, Jingdezhen Ceramic Institute, Jingdezhen, Jiangxi, 333001, PR China;1. Department of Opto-electronic Engineering, National Dong Hwa University, Hualien 97401, Taiwan;2. Karlsruhe Institute of Technology (KIT), Institut fuer Anorganische Chemie, Engesserstrasse 15, D-76131 Karlsruhe, Germany;3. National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan;1. Department of Chemical Engineering, University of Waterloo, 200 University Avenue West, Waterloo, Ontario, N2L 3G1, Canada;2. Waterloo Institute for Nanotechnology, University of Waterloo, 200 University Avenue West, Waterloo, Ontario, N2L 3G1, Canada;1. i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa and CEMOP/UNINOVA, Campus de Caparica, 2829-516 Caparica, Portugal;2. MATIS IMM-CNR and Dipartimento di Fisica e Astronomia, Universitàdi Catania, Via S.Sofia 64, 95123 Catania, Italy;3. Department of Chemistry, Center of Nanotechnology and Advanced Materials, Bar Ilan University, Ramat Gan, Israel;1. Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université Ferhat Abbas Sétif-1, 19000, Sétif, Algeria;2. Laboratoire des Systèmes Photoniques et Optiques Non Linéaires, Institut d’Optique et Mécanique de Précision, Université Ferhat Abbas – Sétif 1, 19000, Sétif, Algeria
Abstract:Thin films of Cu2O comprised of wavelike surface characteristic of compact nanoparticles were synthesized using a facile and cost-effective electrodeposition approach. The distinct surface morphologies with well-aligned crystal orientation were obtained through the controlled electrodeposition parameters. The high resolution AFM combined with the peak force AFM images mapped the nanomechanical and chemical properties of the Cu2O nanostructured films. The structural, optical, and compositional analyses of the as-deposited thin films show bulk Cu2O material. The electrodeposition approach could proceed non-intermittently under ambient conditions, and provides a facile and economic way of depositing thin films of Cu2O with wavelike characteristics. The photoluminescence lifetime was found be very short in the range of 0.8–1.3 ns for Cu2O films. The Mott-Schottky measurement exhibited p-type conductivity and carrier density was found to be ~2×1018. The observed photoluminescence lifetimes, and carrier densities could help implementing the Cu2O films as an efficient hole-conducting, and photoelectrode materials in solar cells and water splitting devices.
Keywords:Electrodeposition  Cuprous oxide  Thin film  Fluorescence lifetime  Material compositional analysis  Mott-Schottky plot
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