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Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry |
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| Authors: | Luis M. Campos Ines Meinel Rosette G. Guino Martin Schierhorn Nalini Gupta Galen D. Stucky Craig J. Hawker |
| Affiliation: | 1. Mitsubishi Chemical Center for Advanced Materials Materials Research Laboratory and University of California Santa Barbara, CA 93111 (USA);2. MC Research and Innovation Center 601 Pine Avenue, Goleta, CA 93117 (USA) |
| Abstract: | |
| Keywords: | cross‐linked polysiloxanes hydrogels imprint lithography thiol‐ene click chemistry |