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Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation |
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| Authors: | M. -Y. Kang T. Yamamoto T. Matsui T. Kuwano |
| Affiliation: | (1) Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, 223 Yokohama, Japan |
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