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薄膜应力的测定
引用本文:李懋廉,顾惠廉. 薄膜应力的测定[J]. 光学精密工程, 1987, 0(6): 17-24
作者姓名:李懋廉  顾惠廉
摘    要:本文介绍一种利用长焦距显微镜观察玻璃薄片由镀膜淀积引起的形变来测量薄膜应力的方法。对于该实验装置的几个主要结构部份、测量的原理及方法和提高测量精度所采取的主要措施作了较详细的描述。最后给出了在不同真空度和蒸发速率时硫化锌膜、氟化镁膜及硫化锌—氟化镁多层膜的应力分别随薄膜几何厚度而变化的实验结果。


Measurement of Stress of Thin Film
Li Maolian,Gu Huilian. Measurement of Stress of Thin Film[J]. Optics and Precision Engineering, 1987, 0(6): 17-24
Authors:Li Maolian  Gu Huilian
Abstract:This paper introduces a method for the measurement of stress of thin film. In this method a long focal distance microscope is used and deformation of the thin film on thin glass sheet is observed. Basic structures of a practical device, measuring principle and main means for improving the measurement accuracy are described in detail. Finally, experimental results showing changes of the stresses for ZnS, MgF2 and ZnS-MgF2 films along with film thicknesses in various vacuum and evaporation velocity rates have been gain.
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