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Substrate biasing effects on the microstructure of magnetron-sputtered AlN films investigated by in situ reflectance interferometry
Authors:P Pigeat  T Easwarakhanthan
Affiliation:Laboratoire de Physique des Milieux Ionisés et Applications, UMR CNRS 7040, Faculté des Sciences, UHP Nancy I, B.P. 239, Vandoeuvre-lès-Nancy 54046, France
Abstract:In situ reflectance interferometry (RI) at 400 nm wavelength was used to investigate the effect of the substrate negative bias on the microstructure of aluminium nitride (AlN) films deposited at room temperature on Si substrates by magnetron sputtering. Their surface reflectance recorded during film deposition promptly yields real-time information on the microstructures developed under oxygen contamination and bias change. Specifically, the refractive index n and the extinction coefficient k are deduced from reflectance using appropriate multilayer optical models and validated by spectroscopic ellipsometry. These optical constants correlate appreciably with the microstructure that evolves between columnar-crystallized and purely amorphous phases including in-between amorphous states containing dispersed nano-AlN grains. These microstructures were identified using ex situ energy dispersive X-ray spectroscopy, transmission electron microscopy and diffraction, X-ray diffraction and Auger electron spectroscopy. The simple and cost-effective in situ RI thus appears a powerful tool in controlling the microstructures of thin AlN films for desired applications.
Keywords:Reflectance interferometry  Aluminium nitride  Magnetron sputtering  Microstructure  Thin films  Optical properties  Ellipsometry
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