| Sputtering Rates of Alloys in Glow Discharge |
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| 收稿时间： | 1995-07-28 |
Sputtering Rates of Alloys in Glow Discharge |
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| Jianshi REN and Gongshu ZHANG Zhenshu WANG and Jinwei ZHAO. Sputtering Rates of Alloys in Glow Discharge[J]. Journal of Materials Science & Technology, 1995, 11(4): 295-298 |
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| Authors: | Jianshi REN and Gongshu ZHANG Zhenshu WANG and Jinwei ZHAO |
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| Affiliation: | Jianshi REN and Gongshu ZHANG (Institute of Metal Research,Chinese Academy of Science,Shenyang,,China)Zhenshu WANG and Jinwei ZHAO (Shanghai University of Technology Shanghai,,China) |
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| Abstract: | The sputtering rates of alloys were investigated under constant Ar pressure and voltage supplied.The alloys studied in this work range from binary intermetallic alloys to ternary and quaternary alloys. It is revealed that the sputtering rates of alloy targets under steady states are where q is the sputtering rates of alloys, Ci the weight percentage of i-th component in the alloy,and qi0 the sputtering rate of pure metal of i-th component. |
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