Microstructures using RF sputtered PSG film as a sacrificial layer in surface micromachining |
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Authors: | Vivekanand Bhatt Sudhir Chandra Chatar Singh |
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Affiliation: | (1) Department of Electrical Engineering and Computer Science, Case Western Reserve University, 719 Glennan Building, 44106 Cleveland, OH, USA;(2) Department of Electrical Engineering and Computer Science, Case Western Reserve University, 188 Bingham Building, 44106 Cleveland, OH, USA |
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Abstract: | In this paper, we explore RF magnetron sputtered Phosphor-silicate-glass (PSG) film as a sacrificial layer in surface micromachining technology. For this purpose, a 76 mm diameter target of phosphorus-doped silicon dioxide was prepared by conventional solid-state reaction route using P2O5 and SiO2 powders. The PSG films were prepared in a RF (13·56 MHz) magnetron sputtering system at 300 watt RF power, 20 mTorr pressure and 45 mm target-to-substrate spacing without external substrate heating. Microstructures of sputtered silicon dioxide film were fabricated using sputtered PSG film as sacrificial layer in surface micromachining process. |
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