| 硅基图案化HfO2表面微结构的制备和表征 |
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| 引用本文： | 谈国强,博海洋,苗鸿雁,夏傲,贺中亮.硅基图案化HfO2表面微结构的制备和表征[J].功能材料,2009,40(10). |
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| 作者姓名： | 谈国强 博海洋 苗鸿雁 夏傲 贺中亮 |
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| 作者单位： | 陕西科技大学,教育部轻化工助剂化学与技术重点实验室,陕西,西安,710021 |
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| 基金项目： | 国家自然科学基金资助项目(50672055,5087207); 国家科技支撑计划资助项目(2006BAF02A28) |
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| 摘 要： | 结合光刻印技术和HfO2液相自组装沉积成膜技术,在单晶硅表面成功地制备了具有微米级图案结构的HfO2薄膜,该硅基图案化HfO2微结构近来在工业界特别是微电子领域引起极度的关注.X射线衍射(XRD)与扫描电镜(SEM)显示,在图案区域成功制备了HfO2薄膜,EDS能谱测试显示了图案区域的HfO2薄膜的化学组成.
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| 关 键 词： | 微图案 光刻印 HfO2微结构 |
Preparation and characterization of patterned HfO_2 microstructures on silicon surface |
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| TAN Guo-qiang,BO Hai-yang,MIAO Hong-yan,XIA Ao,HE Zhong-liang.Preparation and characterization of patterned HfO_2 microstructures on silicon surface[J].Journal of Functional Materials,2009,40(10). |
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| Authors: | TAN Guo-qiang BO Hai-yang MIAO Hong-yan XIA Ao HE Zhong-liang |
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| Affiliation: | TAN Guo-qiang,BO Hai-yang,MIAO Hong-yan,XIA Ao,HE Zhong-liang(Key Laboratory of Auxiliary Chemistry & Technology for Chemical Industry,Ministry of Education,Shaanxi University of Science and Technology,Xi'an 710021,China) |
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| Abstract: | Micro-patterned HfO_2 films on Si wafers was fabricated by self-assembled monolayers and photolithography technique.This patterned HfO_2 microstructures may be widely used in the field of industrial sector,especially the field of microelectronics.XRD and SEM results show that the patterned HfO_2 thin films were prepared successfully,the chemical composition of HfO_2 thin films observed with EDS spectrum test. |
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| Keywords: | micro-patterns photolithography HfO_2 microstructures |
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