Experimental considerations and fabrication analysis of surface micromachined RF NEMS switch |
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| Authors: | H. U. Rahman R. Ramer |
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| Affiliation: | 1.The Department of Electrical Engineering, College of Electrical and Mechanical Engineering,The National University of Sciences and Technology (NUST),Islamabad,Pakistan;2.The School of Electrical Engineering and Telecommunications,The University of New South Wales (UNSW),Sydney,Australia |
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| Abstract: | This paper presents fabrication and issues related to fabrication of RF NEMS switch using surface micromachining approach. The switch has been fabricated using electron beam lithography. Lift off process has been used in achieving patterned metal layers. Fabrication process has been optimized by overcoming different issues like proximity effect, field stitching. A high resolution 20 nm gap has been achieved during fabrication. Dose-shape correction method has also been used to achieve desired patterns. A four metal layer fabrication process has been developed for fabrication of RF NEMS switch. Simulation and measured results are also presented. |
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