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沉积条件对CVD碳纤维生长的影响
引用本文:王国菊,王必本,王波,郑坤,朱满康,严辉.沉积条件对CVD碳纤维生长的影响[J].功能材料与器件学报,2004,10(3):369-373.
作者姓名:王国菊  王必本  王波  郑坤  朱满康  严辉
作者单位:北京工业大学量子信息材料实验室,北京,100022;聊城大学物理科学与信息工程学院,山东,聊城,252059;北京工业大学量子信息材料实验室,北京,100022;北京工业大学应用数理学院,北京,100022;北京工业大学量子信息材料实验室,北京,100022;北京工业大学应用数理学院,北京,100022
摘    要:用CH4、H2或包含NH3的混合气体为反应气体,利用负偏压增强热丝化学气相沉积方法在沉积有过渡层(Ta或Ti)和催化剂层(NiFe)的Si衬底上制备碳纤维,并用扫描电子显微镜研究了它们的生长和结构,结果发现不同的沉积条件对碳纤维的生长和结构有很大的影响。在无辉光放电的条件下,衬底温度较低时碳纳米管或纤维生长困难;提高衬底温度,能够弯曲生长;在辉光放电的条件下,则呈现定向生长的特点。

关 键 词:碳纤维  辉光放电  负偏压  CVD
文章编号:1007-4252(2004)03-0369-05
修稿时间:2003年9月26日

Influence of deposition conditions on growth and structure of carbon fibers by CVD
WANG Guo-ju,WANG Bi-ben,WANG Bo,ZHENG Kun,ZHU Man-kang,YAN Hui.Influence of deposition conditions on growth and structure of carbon fibers by CVD[J].Journal of Functional Materials and Devices,2004,10(3):369-373.
Authors:WANG Guo-ju    WANG Bi-ben    WANG Bo  ZHENG Kun  ZHU Man-kang  YAN Hui
Affiliation:WANG Guo-ju1,3,WANG Bi-ben1,2,WANG Bo1,ZHENG Kun3,ZHU Man-kang1,YAN Hui1
Abstract:Carbon fibers were synthesized on Si substrates deposited with buffer layers (Ta or Ti) andNiFe catalyst layers by using bias-enhanced hot filament chemical vapor deposition method, using CH4,H2 or mixed gases containing NH3 as reaction gases. Growth and structure of carbon fibers were inves-tigated by scanning electron microscopy. It is found that different deposition conditions greatly affectthe growth and structure of carbon fibers. Without glow discharge, it is difficult to grow carbon fibers at low substrate temperature, the bent carbon fibers can be grown at higher substrate temperature. Withglow discharge, aligned carbon fibers can be obtained. The influence mechanism of different depositionconditions on growth and structure of carbon fibers is discussed in details.
Keywords:carbon fibers  glow discharge  negative bias  CVD  
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