| 硅激光退火动力学 |
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| 引用本文： | 史永基. 硅激光退火动力学[J]. 固体电子学研究与进展, 1986, 0(3) |
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| 作者姓名： | 史永基 |
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| 作者单位： | 洛阳建材专科学校 |
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| 摘 要： | 本文研究了硅激光退火的基本动力学过程和温度梯度对硅喇曼光谱的影响.修正了喇曼测温公式,解决了喇曼散射实验与热熔化模型的矛盾,进一步支持了硅激光退火的热熔化模型.
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Dynamics on Laser Annealing in Silicon |
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| Abstract: | The basic dynamic process of laser annealing in silicon and temperature gredient dependence of Raman spectra of silicon are studied. The formula of Raman temperature measurement is amended, and the contradiction between the Raman scattering experiment and the heat melting model is solved, which supports the hest melting model of laser annealing in silicon. |
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