Formation and gasification of carbon deposits on NiSiO2 catalysts

The deposition of carbon from CH₄ and CO on $\text{Ni}\text{SiO}{}_2$ catalysts was studied in pulse-flow experiments as well as volumetrically with a low-field magnetic permeameter. It was found that carbon, deposited from CH₄ according to: CH₄ → C + 4H, gave rise to the formation of nickel carbide, Ni₃C, only at the surface of the nickel particles (T< 300 °C). However, carbon, deposited from CO according to: 2CO → C + CO₂, led to the formation of a bulk nickel carbide as well as dissolution of carbon interstitially. The reactivity of the carbon thus deposited was studied with both H₂ and H₂O. The rate of reaction with hydrogen appeared to be a function of temperature: the rate passed through a maximum at 200 °C and dropped steeply above 300 °C. The only product of the reaction was CH₄. The reaction with H₂O produced besides CH₄, CO₂ and (at low carbon surface coverages) H₂.