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Surface morphology analysis of natural single crystal diamond chips bombarded with Ar ion beam
Authors:Takashi Nagase  Hiroyuki Kato  Shahjada A Pahlovy  Iwao Miyamoto
Affiliation:Department of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
Abstract:We have studied the surface morphology of natural single crystal diamond chips machined by 0.5-3.0 keV Ar+ ion beam irradiation at ion incidence angles of 0°, 30°, 45°, 60°, and 80° with ion doses from 3.4 × 1018 ions/cm2 to 6.8 × 1018 ions/cm2. The surface of diamond chips machined with 0.5 and 1.0 keV Ar+ ion beam, at angles of ion incidence from 0° to 45° can be made smooth. Results show that the machined surface at ion dose of 6.8 × 1018 ions/cm2 and beam energy of 0.5 and 1.0 keV become ultra-smooth (surface roughness SR = 0.1 nm rms) compared with unprocessed surface (SR = 0.15-2.1 nm rms). Results also confirm the ripple formation on diamond surface at ion incidence angles of 60°-80° by 0.5-3.0 keV Ar+ ion beam. Therefore, the technique of smoothing by choosing ion beam irradiation parameter can be applicable to nano-finishing of diamond tools without ripple formation. This technique can also be applicable in mass production if the diamond surface is mechanically pre-finished.
Keywords:Ion beam  Ripple  Diamond  Surface roughness
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