|
|||||
|
|
Al-Mg-B thin films prepared by magnetron sputtering |
|
| Authors: | Zhanling Wu Yizhen Bai Wenchao Qu Aimin Wu Dong Zhang Jijun Zhao Xin Jiang |
| Affiliation: | a School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China b Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116024, China c School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China d Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Straße 9-11, D-57076 Siegen, Germany |
| Abstract: | Hard, nanocomposite aluminum magnesium boride thin films were prepared on Si (100) substrates with a three target magnetron sputtering system. The films were characterized by X-ray diffraction, atomic force microscope, electron micro-probe, Fourier transform infrared spectroscopy and nanoindentation. The results show that the maximum hardness of the as-deposited films is about 30.7 GPa and these films are all X-ray amorphous with smooth surfaces. The influences of substrate temperature and boron sputtering power on the quality of the films are discussed. From the results of this work, magnetron sputtering is a promising method to deposit Al-Mg-B thin films. |
| Keywords: | Al-Mg-B thin films Magnetron sputtering Boron sputtering power Substrate temperature |
| 本文献已被 ScienceDirect 等数据库收录！ | |