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自聚焦透镜列阵象平面上的辐照度与曝光量
引用本文:黄伟同,杨瀛海.自聚焦透镜列阵象平面上的辐照度与曝光量[J].激光技术,1995,19(6):371-375.
作者姓名:黄伟同  杨瀛海
作者单位:安徽大学物理系
摘    要:本文分析了单位放大率成象条件下自聚焦透镜及其列阵在朗伯光源照射时,象面上的辐照度与曝光特性。自聚焦透镜的长度对辐照度和曝光量的大小与起伏有密切联系。讨论涉及单根自聚焦透镜和一列、两列透镜列阵。选择适当的透镜长度,可兼顾辐照度与曝光量的大小与起伏,从而获得较满意的象质。由自聚焦透镜列阵的曝光量要求可确定复印设备中使用的光源强度和扫描速度。本文对单根、一列、二列自聚焦透镜列阵的辐照度作了实验测量,所得结果与理论分析较好地符合。

关 键 词:自聚焦透镜列阵  重叠度  辐照度  曝光量

Irradiance and exposure on the image surface of self- focusing lens arrays
Huang Weitong,Yang Yinghai,Yu Benli,Luo Pong.Irradiance and exposure on the image surface of self- focusing lens arrays[J].Laser Technology,1995,19(6):371-375.
Authors:Huang Weitong  Yang Yinghai  Yu Benli  Luo Pong
Abstract:The irradiance and exposure on im imaging surface are important factors of effecting the imaging quality.In the imaging system,the Lambertian source is used as a light source,the optical sys-tem adopts self-feeused lens or their array with unit magnification,the system is used to study the chara-cteristics of irradiance and exposure on the imaging plane. The experiments show that the length of the self-focusing lens is closely interrelated to magnitude and fluctuation of the irradiance and exposure,The study deals with the cases of a single self-focusing lens,one-row lens array and two-row lens array.In order to obtain satisfactory imaging qtiality.it is necessary to chcose the appropriate length of lens to re-duce the effect of the fluctuation of irradiance and exposure,According to the exposure requirement of a self-focusing system,the source intensity and scanning speed of a copying machnes can be deteimined.
Keywords:selfoc lens array overlap parameter irradiation exposure
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