Molecular dynamic study for nanopatterning using atomic force microscopy

The atomic force microscopy (AFM)-based nanolithographic technique is currently used to directly machine material surfaces and fabricate nanocomponents for microelectromechanical systems (MEMS) devices. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nanodeformation characteristics of the nanolithography processing of monocrystalline copper. Moreover, the effects of process variables (tool shape, cutting speed, and ploughing depth) on the nanostructural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force); the nature of the nanodeformation ahead of the tool; and the surface quality of the machined material.