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A modified fast parallel algorithm for thinning digital patterns
Affiliation:1. University of Maryland, 7998 Regents Drive, 2110 Symons Hall, College Park, MD 20742, USA;2. Antitrust Division of the US Department of Justice, 950 Pennsylvania Avenue, NW Washington, DC 20530-0001, USA;3. Renmin University of China, 59 Zhongguancun Ave., Haidian District, Beijing, 100872, China
Abstract:A modified version of the fast parallel thinning algorithm proposed by Zhang and Suen is presented in this paper. It preserves the original merits such as the contour noise immunity and good effect in thinning crossing lines; and overcomes the original demerits such as the serious shrinking and line connectivity problems.
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