SU-8: promising resist for advanced direct LIGA applications for high aspect ratio mechanical microparts |
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Authors: | J. Kouba R. Engelke M. Bednarzik G. Ahrens Heinz-Ulrich Scheunemann G. Gruetzner B. Loechel H. Miller D. Haase |
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Affiliation: | 1. BESSY GmbH, Albert-Einstein-Str. 15, 12489, Berlin, Germany 2. Microresist technology, Koepenicker Str. 32, 12555, Berlin, Germany 3. MicroChem Corporation, 1254 Chestnut Street, Newton, MA, 02464, USA 4. Jenoptik Mikrotechnik GmbH, Goeschwitzerstr. 40, 07745, Jena, Germany
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Abstract: | A case study of use of negative type SU-8 X-ray sensitive resist for fabrication of advanced, highly precise, ultra tall direct LIGA mechanical microparts is presented in this paper. Using direct LIGA technique, ~1 mm tall highly precise metallic gear wheels are being fabricated, previously using PMMA based process. Starting from a non-optimized non-satisfying SU-8 process, significant process parameters for process optimization were identified using statistical design of experiment. By varying the significant process parameters, SU-8 process was further optimized with respect to critical aspect of sidewall bow and tilt of metallic structures. After the optimization, metallic parts fabricated using SU-8 process showed comparable quality as those fabricated using PMMA based process. |
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