Properties and preparation of amorphous chromium carbide electroplates

The electrochemical and corrosion behavior of chromium electroplates formed in sulfuric acid solutions of Cr(III) in the presence of oxalates was studied by measuring steady-state polarization curves in 0.5 M H₂SO₄ solution. These electroplates demonstrate no active dissolution region and their open-circuit potentials are located in the passivity region, i.e. shifted substantially in the positive direction as compared with those of metallurgical chromium and electroplates from standard chrome-plating baths. The results of X-ray photoelectron spectroscopy (XPS) studies evidence that the passive metal surface layer several nanometers thick consists of chromium oxides with incorporated carbides formed during electroplating. It is supposed that the peculiarities of the corrosion and electrochemical behavior of the deposits under study can be attributed to the presence in them of chromium carbides, which operate as cathodic agents. At the same time, the formation of these carbide compounds during the cathodic deposition of chromium electroplates from sulfuric acid Cr(III) solutions in the presence of sodium oxalate is a result of electrocatalytic activity of metal chromium. The latter assumption is confirmed by XPS analysis of surface layers formed during the exposure of chromium to sulfuric acid solutions containing organic substances.