Quantitative characterization of protective films grown on copper in the presence of different triazole derivative inhibitors

The protective films developed on copper by anodic polarization in a borate-buffered solution containing benzotriazole (BTAH), 1-hydroxybenzotriazole (BTAOH) or 3-amino 1, 2, 4-triazole (ATA) have been characterized using coulometric experiments and an electrochemical quartz crystal microbalance (EQCM). The combination of these two techniques has allowed the CuO and Cu₂O layers and the cuprous-organic layer to be analyzed quantitatively. In the presence of BTAOH, the oxide layers were very similar to those formed in inhibitor-free solution and BTAOH appeared to be adsorbed on the oxide film. In the presence of BTAH, a thick Cu₂O film was covered by a Cu-BTA film containing 8% Cu⁺ ions. Cupric oxide appeared on Cu₂O areas uncovered by Cu-BTA. In the presence of ATA, the Cu₂O layer was very thin and the greater part of Cu⁺ ions (75%) was involved in a thick Cu-ATA film.