射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征

使用射频辉光放电等离子体辅助化学气相沉积技术（简称RFGDPECVD）在玻璃载玻片表面沉积类金刚石薄膜。用原子力显微镜（AFM）、摩擦试验仪、划痕试验机测定了其表面形貌、耐磨性及附着性。采用X射线光电子能谱（XPS）、分光光度计对两种气源（C4H10、C2H2）制备的DLC薄膜微观组成和透光率进行了检测和对比。结果表明：DLC薄膜的表面光滑、平整，表面粗糙度随沉积时间的增加单调递增；耐磨性及附着性优良；与C4H10相比使用C2H2作为碳源气体可以得到较高Sp^3含量和较低Sp^1含量的DLC膜；C2H2制备DLC薄膜的透光率低于C4H10；同一种碳源气体，反应流量比例越小，则DLC薄膜的透光性越好。

Preparation technique and performances characterization of diamondlike carbon films by RFGDPECVD method

The diamond-like carbon（DLC） films were successfully deposited on the glass substrates by radio frequency glow discharge plasma enhanced chemical vapor deposition （RFGDPECVD） technology method. The surface morphology, wear resistance and adhesion of the DLC films were tested by means of atomic force microscope （AFM）, friction tester and scratch tester. Also the microstructures and light transmittance rate of the DLC films by the two gas （C4 H10, C2 H2 ） were measured and compared by X-ray photoelectron spectroscopy （XPS） and spectrophotometer. The results show that the DLC films have smooth surface morphology and surface roughness increases with deposition time prolonged i their wear resistance and adhesion are excellent; higher sp3content and lower sp1 content in DLC films can be obtained in case of using C2H2 as a carbon source gas. However, the transmittance rate of DLC films by C2H2 is inferior to that by C4H10. For the same carbon source gas the lower the flow rate the better the light transmittance rate of DLC films.