| 适用于神经接口的硅基微电极制作 |
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| 引用本文： | 隋晓红,张若昕,裴为华,鲁琳,陈弘达. 适用于神经接口的硅基微电极制作[J]. 半导体学报, 2006, 27(10): 1703-1706 |
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| 作者姓名： | 隋晓红 张若昕 裴为华 鲁琳 陈弘达 |
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| 作者单位： | 中国科学院半导体研究所,集成光电子学国家重点联合实验室,北京,100083;中国科学院半导体研究所,集成光电子学国家重点联合实验室,北京,100083;中国科学院半导体研究所,集成光电子学国家重点联合实验室,北京,100083;中国科学院半导体研究所,集成光电子学国家重点联合实验室,北京,100083;中国科学院半导体研究所,集成光电子学国家重点联合实验室,北京,100083 |
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| 基金项目： | 国家高技术研究发展计划(863计划)，国家自然科学基金 |
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| 摘 要： | 采用表面MEMS工艺制作了二维多通道的硅基微电极阵列,用于提取脑神经电信号.在整个工艺制作过程中需要三步光刻,制作的硅针长1.2mm,宽100μm,厚30μm,同时各个记录点的间距为200μm,可以形成良好的信号隔离.对微电极的阻抗特性进行了体外测试,结果表明,随着频率由0变为10MHz,单个记录点阻抗由14MΩ下降到1.9kΩ.将微电极黏附到印刷线路板,通过金丝压焊提取各个通道信号,大大提高了植入的可操作性以及信号提取的可靠性.
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| 关 键 词： | 微电极阵列 神经接口 MEMS工艺 |
| 收稿时间： | 2015-08-18 |
| 修稿时间： | 2006-05-30 |
Fabrication of a Silicon-Based Microprobe for Neural Interface Applications |
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| Sui Xiaohong, Zhang Ruoxin, Pei Weihua, Lu Lin, Chen Hongda. Fabrication of a Silicon-Based Microprobe for Neural Interface Applications[J]. Journal of Semiconductors, 2006, In Press. Sui X H, Zhang R X, Pei W H, Lu L, Chen H D. Fabrication of a Silicon-Based Microprobe for Neural Interface Applications[J]. Chin. J. Semicond., 2006, 27(10): 1703.Export: BibTex EndNote |
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| Authors: | Sui Xiaohong Zhang Ruoxin Pei Weihua Lu Lin Chen Hongda |
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| Affiliation: | State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China |
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| Abstract: | A two-dimensional (2D) multi-channel silicon-based microelectrode array is developed for recording neural signals. Three photolithographic masks are utilized in the fabrication process. SEM images show that the microprobe is 1.2mm long,100μm wide,and 30μm thick,with recording sites spaced 200μm apart for good signal isolation. For the individual recording sites, the characteristics of impedance versus frequency are shown by in vitro testing. The impedance declines from 14MΩ to 1.9kΩ as the frequency changes from 0 to 10MHz. A compatible PCB (print circuit board) aids in the less troublesome implantation and stabilization of the microprobe. |
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| Keywords: | microelectrode array neural interface MEMS |
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