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AlGaN/GaN HEMT高场应力退化及紫外光辐照的研究
引用本文:王冲,张进城,郝跃,杨燕. AlGaN/GaN HEMT高场应力退化及紫外光辐照的研究[J]. 半导体学报, 2006, 27(8): 1436-1440
作者姓名:王冲  张进城  郝跃  杨燕
作者单位:西安电子科技大学微电子研究所,宽禁带半导体材料与器件教育部重点实验室,西安,710071
基金项目:国家重点基础研究发展计划(973计划),国防科技预研项目,国防重点实验室基金,国家重点基础研究发展计划(973计划),西安电子科技大学校科研和教改项目
摘    要:采用不同的应力偏压发现器件特性的下降程度随应力偏置电压的增大而增大.经过3×104s 40V高场应力后,蓝宝石衬底 AlGaN/GaN HEMT饱和漏电流下降5.2%,跨导下降7.6%.从器件直流参数的下降分析了应力后的特性退化现象并与连续直流扫描电流崩塌现象进行了对比,同时观察了紫外光照对应力后器件特性退化的恢复作用.直流扫描电流崩塌现象在紫外光照下迅速消除,但是紫外光照不能恢复高场应力造成的特性退化.

关 键 词:AlGaN/GaN  高电子迁移率晶体管  热电子  电子陷阱
收稿时间:2015-08-20

Degradation Under High-Field Stress and Effects of UV Irradiation on AlGaN/GaN HEMTs
Wang Chong, Zhang Jincheng, Hao Yue, Yang Yan. Degradation Under High-Field Stress and Effects of UV Irradiation on AlGaN/GaN HEMTs[J]. Journal of Semiconductors, 2006, In Press. Wang C, Zhang J C, Hao Y, Yang Y. Degradation Under High-Field Stress and Effects of UV Irradiation on AlGaN/GaN HEMTs[J]. Chin. J. Semicond., 2006, 27(8): 1436.Export: BibTex EndNote
Authors:Wang Chong  Zhang Jincheng  Hao Yue  Yang Yan
Affiliation:Key Laboratory of the Ministry of Education for Wide Band-gap Semiconductor Materials and Devices,Microelectronics Institute,Xidian University,Xi’an 710071,China;Key Laboratory of the Ministry of Education for Wide Band-gap Semiconductor Materials and Devices,Microelectronics Institute,Xidian University,Xi’an 710072,China;Key Laboratory of the Ministry of Education for Wide Band-gap Semiconductor Materials and Devices,Microelectronics Institute,Xidian University,Xi’an 710073,China;Key Laboratory of the Ministry of Education for Wide Band-gap Semiconductor Materials and Devices,Microelectronics Institute,Xidian University,Xi’an 710074,China
Abstract:After 3E4s of high-field stress,the drain current and transconductance of AlGaN/GaN HEMTs grown on sapphire are decreased by 5.2% and 7.6%,respectively.The degradation is more obvious than under high stress bias.The reason for this is investigated and compared to the current collapse that occurs under DC sweeping.The effects of UV irradiation on the recovery of the devices are observed.UV illumination can eliminate the DC sweeping current collapse,but it cannot reverse the degradation characteristics caused by the high-field stress.
Keywords:AlGaN/GaN   HEMT   hot electron   electron trap
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