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微晶玻璃研磨抛光超光滑表面粗糙度的工艺研究
引用本文:刘春红,李成贵,张庆荣,贾世奎.微晶玻璃研磨抛光超光滑表面粗糙度的工艺研究[J].郑州大学学报(工学版),2007,28(4):126-128.
作者姓名:刘春红  李成贵  张庆荣  贾世奎
作者单位:北京航空航天大学,仪器科学与光电工程学院,北京,100083
摘    要:研磨抛光采用浸液式定偏心锡磨盘抛光方式,研究抛光液浓度、PH值、上下研磨盘转速、抛光时间等参数对微晶玻璃超光滑表面粗糙度的影响,粗糙度的测量采用NT1100干涉仪.实验结果表明:粗糙度受PH值影响比较大;试件在低浓度弱碱抛光液中,延长抛光时间可降低表面粗糙度值并获得高质量的表面,最终测得表面粗糙度为Ra=0.37 nm.

关 键 词:微晶玻璃  研磨抛光  粗糙度  工艺
文章编号:1671-6833(2007)04-0126-03
修稿时间:2006年9月12日

Study on the Technology of the Super Smooth Surface Roughness of Polished Ceramic Glass
LIU Chun-hong,LI Cheng-gui,ZHANG Qing-rong,JIA Shi-kui.Study on the Technology of the Super Smooth Surface Roughness of Polished Ceramic Glass[J].Journal of Zhengzhou University: Eng Sci,2007,28(4):126-128.
Authors:LIU Chun-hong  LI Cheng-gui  ZHANG Qing-rong  JIA Shi-kui
Abstract:The polishing manner of fixed eccentricity immersed tin lap was used in lapping and polishing.The effect of concentration of polishing fluid,PH value,rotate speed,and polishing time on super smooth surface roughness of ceramic glass was researched.The roughness was measured by NT1100 interferometer.The influence of PH value on roughness is greater than that of other parameters.The roughness is decreased by increasing polishing time under the workpiece in low concentration alkalescent polishing fluid,and high surface quality is secured.Finally,with the reasonable choice of polishing parameter,surface roughness of Ra is 0.37nm.
Keywords:ceramic glass  lapping and polishing  technology
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