脉冲激光制备ZnO压敏电阻薄膜

利用脉冲激光沉积技术，在光学玻璃基片上制备了性能良好的ＺｎＯ压敏多晶薄膜，其非线性系数ａ≥６，压敏转折电压约３．５Ｖ。

ZnO Piezoresistive Thin Film Fabricated by Pulsed Laser

Polycrystalline ZnO piezoresistive thin films with good characteristics have been prepared on optical glass substrates by using pulsed laser deposition(PLD) technique. The nonlinear coefficient is above 6, and the threshold voltage is about 3.5 V. The XRD spectrum of the samples with different deposition conditions show that, for forming nonlinear characteristics there must be ZnO phase, Zn 7Sb 2O 12 spinel phase and rich Bi phase in the films. This is consistent with the conclusions of bulk varistor materials. Only when the temperature and the kinds of substrates are suitable, it is possible to deposit the excellent ZnO polycrystalline thin films without heat treatment.