| 特种硬质薄膜的制备 |
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| 引用本文： | 于玉城,赵广彬,栾道成,晋勇,刘志远.特种硬质薄膜的制备[J].西华大学学报(自然科学版),2007,26(1):40-42. |
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| 作者姓名： | 于玉城 赵广彬 栾道成 晋勇 刘志远 |
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| 作者单位： | 1. 西华大学材料学院,四川,成都,610039
2. 四川大学材料学院,四川,成都,610064 |
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| 基金项目： | 四川省级重点实验室建设项目 |
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| 摘 要： | 本文采用热阴极离子镀技术在GCr15基体上制备了CrNx薄膜,利用X射线衍射（XRD）方法和显微硬度分析方法对所制备的样品进行了结构分析和性能测试。结果表明沉积薄膜工艺参数,如基体偏压和N2分压等对薄膜的结构和性能有重要影响。在本试验条件下,获得的样品表面硬度值最高可达HV2338。
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| 关 键 词： | 热阴极离子镀 |
| 文章编号： | 1673-159X（2007）01-0040-03 |
| 修稿时间： | 2006-10-08 |
The Preparation of CrNx Film |
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| YU Yu-cheng.The Preparation of CrNx Film[J].Journal of Xihua University:Natural Science Edition,2007,26(1):40-42. |
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| Authors: | YU Yu-cheng |
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| Abstract: | CrNx films were prepared on GCr15 steel using hot cathode ion plating technology in this study.The phase and structure analysis was performed on samples by X-ray diffraction(XRD).Microhardness of the samples was measured using microhardness tester,and the results were analyzed and discussed.The results show that plating technological parameters of film such as substrate bias-voltage and N2 partial pressure etc.have great effect on the structure and nature of the film.In this test,the highest microhardness of samples is HV 2338. |
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| Keywords: | CrNx XRD |
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