| 用原子力显微镜分析Al2O3抛光处理的ITO玻璃表面形貌 |
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| 引用本文： | 耿立威,张晓燕,王立,王广德.用原子力显微镜分析Al2O3抛光处理的ITO玻璃表面形貌[J].理化检验(物理分册),2007,43(9):433-436. |
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| 作者姓名： | 耿立威 张晓燕 王立 王广德 |
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| 作者单位： | 1. 吉林师范大学,环境工程学院,四平,136000
2. 吉林师范大学,信息技术学院,四平,136000 |
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| 基金项目： | 吉林省科技发展计划，吉林省教育厅科研项目，吉林省教育厅科研项目，河南省南阳市科技局资助项目 |
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| 摘 要： | 利用原子力显微镜(AFM)研究有机电致发光器件的阳极材料铟锡氧化物(ITO)玻璃的表面形貌.结果表明,用不同粒度Al2O3抛光液处理以及用相同粒度Al2O3抛光液在不同超声时间处理的ITO表面形貌都有不同程度的变化,所制备的有机电致发光器件(OLED)性能也有相应的改变,制备的OLED的最大亮度由12 350 cd/m2提高到25 880 cd/m2,最大效率也提高了50%.基于AFM形貌研究,确定了OLED的优化条件.
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| 关 键 词： | 原子力显微镜 铟锡氧化物 抛光处理 有机电致发光器件 |
| 文章编号： | 1001-4012（2007）09-0433-04 |
| 收稿时间： | 2007-03-13 |
| 修稿时间： | 2007年3月13日 |
SURFACE CHARACTERISTIC OF ITO GLASS POLISHED Al2O3 USING ATOMIC FORCE MICROSCOPY |
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| GENG Li-wei,ZHANG Xiao-yan,WANG Li,WANG Guang-de.SURFACE CHARACTERISTIC OF ITO GLASS POLISHED Al2O3 USING ATOMIC FORCE MICROSCOPY[J].Physical Testing and Chemical Analysis Part A:Physical Testing,2007,43(9):433-436. |
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| Authors: | GENG Li-wei ZHANG Xiao-yan WANG Li WANG Guang-de |
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| Affiliation: | 1. College of Environment Engineering, Jilin Normal University, Siping 136000, China; 2. College of Information Technology, Jilin Normal University, Siping 136000, China |
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| Abstract: | The surface characteristic of Indium-Ti-Oxide were observed using atomic force microscopy. The results indicated that there were differences between surface characteristic of ITO glass after polished by containing different granularity Al2O3 solutions, so did containing uniform granularity Al2O3 while different ultrasonic treatment. Performance changed with the different ITO glass surface characteristic. The maximum brightness was promoted from 12 350 cd/m^2 to 25 880 cd/m^2 after treatment, and the maximum efficiency could increase 50%. Optimization conditions of manufacture OLED were confirmed according the surface characteristic study using AFM. |
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| Keywords: | Atomic force microscopy Indium tin oxide Polishing treatment Organic light-emitting device |
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