| 聚对苯(撑)二甲基膜的化学气相沉积(CVD)聚合 |
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| 引用本文： | 孙霞容,浦鸿汀.聚对苯(撑)二甲基膜的化学气相沉积(CVD)聚合[J].材料导报,2004,18(3):54-56,53. |
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| 作者姓名： | 孙霞容 浦鸿汀 |
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| 作者单位： | 同济大学材料科学与工程学院,上海,200092;同济大学材料科学与工程学院,上海,200092 |
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| 摘 要： | 采用化学气相沉积(CVD)聚合工艺制备的对苯撑二甲基聚合物可广泛应用在航天、航空、军工、电子、生物医学工程、控制系统、文物保护、纳米材料和磁性材料等诸多领域.综述了聚对苯(撑)二甲基系列膜的化学气相沉积聚合工艺和原理,介绍了底物温度和沉积舱压力等主要因素对膜沉积率的影响和膜的一些主要性能,并讨论了典型的Parylene N膜的光氧降解性能.
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| 关 键 词： | 化学气相沉积 Parylene 聚对苯(撑)二甲基 Gorhm过程 光氧降解 |
Chemical Vapor Deposition Polymerization of Poly(p-xylylene)s |
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| SUN Xiarong PU Hongting.Chemical Vapor Deposition Polymerization of Poly(p-xylylene)s[J].Materials Review,2004,18(3):54-56,53. |
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| Authors: | SUN Xiarong PU Hongting |
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| Abstract: | Poly (p-xylylene)s prepared by chemical vapor deposition (CVD) polymerization can be widely used in space technology, aeronautical engineering,ordnance industry, electronics, biomedicine, control system, preservation of antiques, nano materials, magnetic materials, etc. Mechanism and technology of poly (p-xylylene)s preparation by CVD polymerization are reviewed in this paper. Effects of substrate temperature and deposition chamber pressure on the deposition rate of the polymer are discussed. Main properties of parylenes are described, and the photo oxidation of typical parylene N is analysed. |
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| Keywords: | chemical vapor deposition parylene poly (p-xylylene) gorham process photo oxidation |
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