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气体渗硼层孔洞成因探讨
引用本文:韩文祥,李辉,姜信昌. 气体渗硼层孔洞成因探讨[J]. 河北工业大学学报, 1991, 0(4)
作者姓名:韩文祥  李辉  姜信昌
作者单位:河北工学院机二系,河北工学院机二系,河北工学院机二系
摘    要:渗层易产生孔洞,是长期困扰气体渗硼发展的主要问题之一。本文通过对渗硼孔洞的电子探针扫描和气体渗硼的热力学分析证实:在BCl_3+H_2渗硼气氛中,孔洞主要是由Fe-Cl产物组成,气氛中的残留H_2O、O_2加剧了产物的形成。严格控制气氛中残留H_2O、O_2含量不仅可有效地防止孔洞的形成,而且可大幅度降低BCl_3用量。此外还讨论了B.Cl_2的扩散特点及温度对孔洞形成的影响。

关 键 词:气体渗硼  孔洞  渗硼层  H_2O和O_2  氯化物  严格控制  大幅度扩散

An Investigation for the Cause of theGaseous Boronizing Layer Voids
Han Wenxiang,Li Hui,Jiang Xinchang. An Investigation for the Cause of theGaseous Boronizing Layer Voids[J]. Journal of Hebei University of Technology, 1991, 0(4)
Authors:Han Wenxiang  Li Hui  Jiang Xinchang
Abstract:Boronized layer voids are one of problems which hinders the development of gaseous boronizing for a long time. By means of microscope probe scan- ning and thermodynamics analysis, the paper proves that in the boronizing atmosphere of BCl_3+H_2, the layer voids are mainly composed by the product of iron chloride and the retained H_2O and O_2 in the BCl_3+H_2 atmosphere accelerates the formation of the voids. The strict controlling of the retained content of H_2O and O_2 in the atmosphere not only can efficientlly prevent the formation of the voids, but also have a big increase in lowering the dosage of BCl_3. In addition, the diffusion characteristic of B and Cl atoms and the boronizing temperature have the influence on the formation of the layer voids.
Keywords:Gaseous boronizing  Layer void  Boronized layer  H_2O and O_2  Chloride  Strict controlling  Big increase  Diffusion  
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