电阻阵列非均匀测试与校正方法研究

红外图像生成技术是构建红外成像半实物仿真系统的关键技术之一,其中作为投射器件的电阻阵列一直以来是研究的热点,它存在非均匀性的固有不足。作为非均匀校正的测试手段,稀疏网格法和全屏测试法很早就已被国外研究者提出,取得了良好的校正效果。近来,随着我国电阻阵列研发脚步的跟进,校正方法也不断更新。本文针对国产电阻阵列响应曲线的特性,介绍分析了逆稀疏网格法并提出一种简化的校正流程。同时,针对数据处理方式的不同改进了插值校正方法,继而对比验证了两种校正方法,有效提升校正精度。

Research on non-uniform testing and correction method of resistor array

Infrared image generation technology is one of the key technologies for constructing infrared imaging semi-physical simulation system.Among them,the resistance array as a projection device has been a research hotspot,and it has inherent defects of non-uniformity.As a test method for non-uniformity correction,sparse grid method and full-screen test method have been proposed by foreign researchers for a long time,and have achieved good correction results.Recently,with the follow-up of the development of resistor arrays in China,the correction method has been continuously updated.In this paper,the inverse sparse grid method is introduced and a simplified calibration process is proposed for the characteristics of the domestic resistance array response curve.The blind iterative correction method is improved on the basis of the sparse grid lighting mode,and then the two correction methods are compared and verified to improve the correction accuracy.