刻蚀辅助激光灰度改性技术制备硅基三维微结构

硅基三维微纳结构在红外成像与探测方面具有重要的应用价值.然而,受加工技术的限制,硅基复杂面型三维微纳结构的制备仍然是一个难题.本文提出了利用刻蚀辅助激光灰度改性技术制备硅基三维微纳结构.利用激光改性制备的硅的氧化层作为刻蚀掩膜,经过刻蚀实现灰度图形向衬底的转移.研究发现,氧化层的抗刻蚀能力可以通过激光加工参数进行调控,...

Fabrication of silicon 3D microstructures by etching assisted femtosecond laser gray-scale modification

The silicon three-dimensional micro/nanostructures have important applications in infrared imaging and detection.However,due to the limitation of processing technology,it is still a challenge to prepare complex three-dimensional micro/nanostructures on the silicon.This paper presents the idea of preparing three-dimensional micro/nanostructures by etching-assisted femtosecond laser gray-scale modification technology.The oxide siliconlayers prepared by laser modification can act as the etching mask,and then three-dimensional structures are fabricatedafter etching.The research indicates that laser processing parameters,such as laser power and scanning pitch,can adjust the anti-etching ability of the oxide layer.The controllable preparation of three-dimensional microstructures with stepped,slope shape and complex curved surfaces can be realized by etching the locally controlled anti-etching oxide layer pattern which is programming-designed.Besides,it also verifies the feasibility of this technology in the preparation of silicon-based micro-optical elements with complex profiles.