| 一种纯金电化学抛光的新方法 |
| |
| 引用本文： | 马胜利 井晓天. 一种纯金电化学抛光的新方法[J]. 兵器材料科学与工程, 1998, 21(6): 31-34 |
| |
| 作者姓名： | 马胜利 井晓天 |
| |
| 作者单位： | [1]西安交通大学 [2]西安理工大学 |
| |
| 摘 要： | 提出了一种在硫酸基电解液中纯金的电化学抛光方法，讨论了电解液组成浓度及工艺操作参量对纯金电化学抛光表面质量的影响。结果表明：在一定浓度组成的硫酸基电解液中，采用合适的工艺操作参量（ＤＡ，Ｔ，ｔ）可以使现有纯金表面的粗糙度下降两级，而表面光亮度明显提高，并呈鲜艳的金黄色外观。
|
| 关 键 词： | H_2SO_4基电解液 电化学抛光 纯金 粗糙度 光亮度 |
ADVANCED METHOD OF PURE GOLD ELECTROPOLISHING IN SULFURIC ACID BASED ELECTROLYTE |
| |
| Abstract: | a advanced method of pure gold(99.99%Au) electropolishing in sulfuric acid based electrolyte was proposed in this paper. Inflence of electrolyte composition and process paramters on surface roughness as well as brightness during electropolishing was studied experimentally. It has shown that the surface roughness of pure gold could be reduced by 2 grade and surface brightness could be improved obviously, and has a nice goldcolour looking. |
| |
| Keywords: | sulfuric acid based electrolyte electropolishing pure-gold roughness brightness |
| 本文献已被 CNKI 维普 等数据库收录！ |
