首页 | 本学科首页   官方微博 | 高级检索  
     


A new technique for measuring MOSFET inversion layer mobility
Authors:Huang  C-L Faricelli  JV Arora  ND
Affiliation:Digital Equipment Corp., Hudson, MA;
Abstract:An experimental technique for accurately determining both the inversion charge and the channel mobility μ of a MOSFET is presented. With this new technique, the inversion charge is measured as a function of the gate and drain voltages. This improvement allows the channel mobility to be extracted independent of drain voltage VDS over a wide range of voltages (VDS=20-100 mV). The resulting μ(VGS) curves for different VDS show no drastic mobility roll-off at V GS near VTH. This suggests that the roll-off seen in the mobility data extracted using the split C- V method is probably due to inaccurate inversion charge measurements instead of Coulombic scattering
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号