Fabrication of micro pore optics with smooth sidewall using X-ray lithography |
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Authors: | Tianchong Zhang Futing Yi Bo Wang Jing Liu Marina Ashmkhan Xinshuai Zhang |
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Affiliation: | 1. Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China
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Abstract: | Micro pore optics (MPO) as an X-ray imaging system is perfectly suited for the applications in space telescopes due to its light-weight and high-resolution properties. We report the fabrication of MPO samples by LIGA process focusing on its sidewall surface used as mirrors for X-ray reflection. An intermediate mask is fabricated and used to obtain the working mask in order to avoid the UV exposure to a very thick photo resist layer. Around 400 μm-thick nickel MPO plate is obtained with the aspect ratio of the square pore and sidewall of 8 and 32, respectively. The root mean square roughness of the sidewall surface is below 10 nm in a 5 × 5 μm2 region. Some striations are found on the sidewall surface originating from the jagged edge of the chromium coating on the UV mask. |
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