Model for chemical vapor deposition of nanostructured ceramics inside tubes under high temperature laminar flow conditions |
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| Affiliation: | 1. Department of Material Science and Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan;2. Department of Polymer Engineering Mechanical Engineering Technology, College of Industrial Technology, King Mongkut''s University of Technology North Bangkok, Bangkok 10800, Thailand;1. School of Materials Science and Engineering, Zhengzhou University, Zhengzhou, Henan 450001, PR China;2. School of Chemical Engineering, Zhengzhou University, Zhengzhou, Henan 450001, PR China;3. School of Minerals Processing & Bioengineering, Central South University, Changsha, Hunan 410083, PR China;4. Baosteel Resources Holding (Shanghai) Co., Ltd, Shanghai 200080, PR China;3. Department of Materials Science and Engineering, Advanced Materials Processing and Analysis Center, University of Central Florida, Orlando, FL 32816, USA;1. College of Materials Science and Engineering, Zhejiang University of Technology, Hangzhou, 310014, China;2. College of Materials Science and Engineering, China Jiliang University, Hangzhou, 310018, China |
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| Abstract: | This paper describes the mathematical modeling of a CVD process designed to coat the inside of a tube with a ceramic film. The film was analyzed by XPS to reveal layers of nanostructure where SiCO changed to SiOC stoichiometry at sputtering depths of 33 nm. Relevant expressions are either derived from first principles or constructed using commonly measured processing parameters. These equations include parameters, such as the gas residence time and precursor pump rate, which are both useful to the researcher and necessary for a plant operator. |
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