Nanostructured Ni3Al layers and Ni3Al/Ni multilayers obtained by magnetron sputtering |
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| Affiliation: | 1. School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran, Iran;2. Institute of Nanotechnology, Karlsruhe Institute of Technology, 76021 Karlsruhe, Germany;3. Center of Excellence for High Performance Materials, University of Tehran, Tehran, Iran;1. Atomic and Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai 85, India;2. Beamline Development and Application Section, Bhabha Atomic Research Centre, Mumbai 85, India;1. State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, China;2. Key Laboratory of Advanced Micro-structured Materials MOE, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;3. Thin-film Optics Laboratory, Hongce Optoelectronics Ltd, Suzhou 215431, China;4. Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China;5. Shanghai Synchrotron Radiation Facility (SSRF), Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201203, China |
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| Abstract: | ![]()
Intermetallic Ni3Al thin layers and Ni3Al/Ni multilayers were deposited on a Si wafer by means of magnetron sputtering. The structure and morphology of the layers have been characterized by X-ray diffraction, transmission electron microscopy and atomic force microscopy. The polycrystalline films are textured in the (111) direction and have grain sizes below 20 nm. Superlattice reflections due to chemical order have been observed in the electron microscope. It is shown by x-ray diffraction that the multilayers grow coherently on the amorphous substrate. |
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