| 热处理对FTO薄膜结构和光电性质的影响 |
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| 引用本文： | 郎文静. 热处理对FTO薄膜结构和光电性质的影响[J]. 信息记录材料, 2014, 0(4): 42-45 |
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| 作者姓名： | 郎文静 |
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| 作者单位： | 天津大学低维功能材料物理与制备技术重点实验室,天津300072 |
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| 摘 要： | 系统研究了在O2氛围中不同的热处理温度对FTO薄膜结构、形貌和光电性质的影响。结果表明,当退火温度较低时,样品的结晶度、可见光透过率和导电性均随退火温度的升高而升高;随着退火温度的进一步升高,样品的光电特性开始变差。当退火温度为300℃时,得到了具有最低电阻率和最高可见光透过率的样品,其室温电阻率为2.97×10-4Ωcm,可见光透过率达83%。
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| 关 键 词： | 热处理 FTO薄膜 结构 光学性质 电学性质 |
Effects of Thermal Treatment on the Structure Structural,Electrical and Optical Properties of the FTO Films |
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| LANG Wen-jing. Effects of Thermal Treatment on the Structure Structural,Electrical and Optical Properties of the FTO Films[J]. Information Recording Materials, 2014, 0(4): 42-45 |
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| Authors: | LANG Wen-jing |
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| Affiliation: | LANG Wen-jing (Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Tianjin University, Tianjin 300072, China) |
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| Abstract: | The effects of thermal treatment on the structure, surface morphology, optical and electrical properties of the FTO films were systematically investigated. The experimental resuhs show that the crystallinity, optical transmittance in the visible regime and conductivity of the films increased with increasing annealing temperature in the relatively low annealing temperatures, however, the optical and electrical properties of the films began to deteriorate with further increase of the annealing temperature. The lowest room resistivity of and highest optical transmittance in the visible regime of 83% were obtained in the FTO film annealed at 300℃. |
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| Keywords: | thermal treatment FTO films structure optical property electrical property |
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