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The effect of deposition conditions on the refractive index of LTCVD SiO2 films |
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| Authors: | C. Cobianu C. Pavelescu A. Paunescu |
| Affiliation: | (1) Microelectronica, Str. Erou Iancu Nicolae 34 B, R-72996 Bucharest, Romania;(2) IPRS Baneasa, Str. Erou Iancu Nicolae 32 A, R-72996 Bucharest, Romania |
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