| 化学气相淀积在无机新材料制备中的应用 |
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| 引用本文： | 郭新,袁润章.化学气相淀积在无机新材料制备中的应用[J].材料科学与工程学报,1994(1). |
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| 作者姓名： | 郭新 袁润章 |
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| 作者单位： | 武汉工业大学 |
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| 摘 要： | 本文讨论了化学气相淀积在超细粉，纳米复合材料及梯度功能材料制备中的应用，并结合实例分析了化学气相淀积的工艺特性及所制备材料的性能、显微组织特点。
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| 关 键 词： | 化学气相淀积，无机新材料，制备 |
Applications of Chemical Vapor Deposition in Preparation of New Inorganic Materials |
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| Guo Xin,Yuan Run-zhang.Applications of Chemical Vapor Deposition in Preparation of New Inorganic Materials[J].Journal of Materials Science and Engineering,1994(1). |
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| Authors: | Guo Xin Yuan Run-zhang |
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| Affiliation: | Wuhan University of Technology |
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| Abstract: | The applications of CVD in the preparations of ultrafine powders,nanocompositers,and functionally gradient materials were discussed,the processing features of CVD,the properties and the microstructures of the materials thus prepared were analyzed with specific examples. |
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| Keywords: | CVD New lnorganic Materials Preparation |
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