| 用等离子体蚀刻法提高浮雕全息光栅的衍射效率 |
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| 引用本文： | 张晓春,江朝川,郭履容. 用等离子体蚀刻法提高浮雕全息光栅的衍射效率[J]. 激光杂志, 1993, 0(1) |
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| 作者姓名： | 张晓春 江朝川 郭履容 |
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| 作者单位： | 四川大学信息光学研究所 成都(张晓春，江朝川)，四川大学信息光学研究所 成都(郭履容) |
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| 摘 要： | 本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法.从光致抗蚀剂层蚀刻到Si_3N_4薄膜层的光栅衍射效率已达31.2％,比原版光致抗蚀剂层母光栅的衍射效率提高了2.5倍。这种方法可制作优质的浮雕薄膜光栅。
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| 关 键 词： | 浮雕全息光栅 等离子体蚀刻 衍射效率 |
Improve diffraction efficiency of relief holographic gratings by plasma etch |
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| Zhang Xiaochun Jiang Chaochuan Guo Lurong. Improve diffraction efficiency of relief holographic gratings by plasma etch[J]. Laser Journal, 1993, 0(1) |
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| Authors: | Zhang Xiaochun Jiang Chaochuan Guo Lurong |
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| Abstract: | The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.The diffraction efficiency of these relief gratings of Si3N4 thin film which is transfered by plasma etch from photoresist layer have reached the value of 31.2%, is 2.5 times of original gratings of photoresist layer.The method can be used to fabricate excellent relief thin film gratings. |
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| Keywords: | relief holographic grating plasma etch diffraction efficiency |
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