Preparation and lifetest of niobium Josephson junction tunnel diodes and arrays |
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| Authors: | Paul Rissman Thomas Palholmen |
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| Affiliation: | Laboratorio di Cibernetica del C.N.R., Arco Felice, Napoli, Italy;Division of Electrical Engineering, Chalmers University of Technology, Gottenburg, Sweden |
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| Abstract: | Photoresist technology can be used to prepare superconductive tunnel junctions and arrays. Niobium thin films, which produce durable junctions, are chemically etched to form the base superconductor. NbNbOxPb junctions continue to function after more than 800 days of testing. The failure mechanism for these junctions is the decrease of conductance. The niobium photoresist technology is being used to investigate neuristor-type devices. |
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