Influence of deposition conditions and substrate structure on the structure of sputtered tellurium films

A study has been made of the growth of tellurium films sputtered onto four substrate materials (cover glass, spinel, quartz and alumina), unheated as well as heated to 100°, 150°, 200° and 250°C. It was found that the structure of the substrate exerted no measurable influence on the structure of the films. However, sputtering conditions do influence the preferred orientation. Tellurium films sputtered onto unheated substrates have a preferred orientation of the (100) type (i.e. with the (100) planes parallel to the substrate). Those on heated substrates show a preferred orientation of the (101) type. Furthermore, thickness is an important factor. Tellurium films with thickness less than 6000 Å have a (100)-type preferred orientation, but thicker films have a (101) orientation. All the observations can be explained in terms of recrystallization taking place during deposition due to heating of the film.