Selective deposition on block copolymer film by thermal evaporation of silver |
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| Authors: | Wei Zou Xiaozhou Cai Jianwen Li Xinyi Dai Haiquan Zhang Aijun Zhou Jingze Li Lijun Song Tomokazu Iyoda |
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| Affiliation: | 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid-state Electronics, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, China;2. Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology, Yokohama, Kanagawa 226-8503, Japan |
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| Abstract: | Selective deposition of Ag onto nanostructured block copolymer film template of poly(ethylene oxide) and poly(methacrylate) with azobenzene mesogen (PEO-b-PMA(Az)) has been done by thermal evaporation technique. A hexagonally arranged pattern or ordered strip structure of the PEO nanocylinders dispersed in the PMA(Az) matrix appears on the pure copolymer film surface after thermal annealing at 140 °C or 110 °C, respectively. Atomic force microscopy confirms that the deposited Ag atoms prefer to wet PMA(Az) matrix domains on the film surface, and finally aggregate into discrete nanoparticles in both cases. An ordered porous metallic layer is created on the hexagonally patterned copolymer template surface due to the preferential interaction of Ag toward the PMA(Az) phase. Alternatively, ordered array of metallic chains is formed on the template featured with strip structure. While the nominal layer thickness of the deposited Ag is 50 nm, the ordered metallic nanostructure disappears, indicating the host copolymer template cannot guide the spatial distribution of the deposited metal any more. |
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| Keywords: | Block copolymer Templating Selective deposition Silver Thermal evaporation Metal layer |
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