反应溅射Zr-Si-N复合膜的微结构与力学性能

在Ar、N2混合气氛中，通过双靶反应磁控溅射方法制备了一系列不同Si含量的Zr-Si-N复合薄膜，采用EDS、XRD、SEM、AFM和微力学探针表征了复合膜的成分、相组成、微结构和力学性能。结果表明：随着Si的加入，Si3N4界面相形成于ZrN晶粒表面并阻止其长大。低Si含量下，晶粒的细化使Zr-Si-N薄膜得到强化，在Si含量为6．2at％时其硬度和弹性模量分别达到最高值29．8GPa和352GPa。继续增加Si的含量，薄膜逐渐向非晶态转变，同时产生ZrxSiy相，并伴随有明显的力学性能降低。Zr-Si-N薄膜力学性能增加受到限制，可能与Si3N4界面相和ZrN晶粒之间的低润湿性有关。

Microstructures and Mechanical Properties of Zr-Si-N Films Prepared by Reactive Sputtering

A series of Zr-Si-N composite films with different Si contents were grown in an atmosphere of Ar and N_2 mixture by reactive magnetron sputtering of a bi-target.The films were characterized with energy dispersive spectroscopy(EDS),X-ray diffraction(XRD),scanning electron microscopy(SEM),atomic force microscopy (AFM) and nano-indentation.The results show that Si contents significantly affect its mechanical properties.Addition of Si results in formation of Si_3N_4 on ZrN grain surfaces,which prevents the grains from growing.As Si content decreases,the strength of the Zr-Si-N films increases.For instance,with a Si content of 6.2at%,both its hardness and its elastic module reach the maxima,29.8 GPa and 352 GPa,respectively,possibly because of small size of the ZrN grains and of existence Si_3N_4 at the interfaces.While Si contents increases higher than 6.2at%,crystalline Zr-Si-N composite films turn into amorphous films with decreasing mechanical properties possibly because of the low wettability of Zr_xSi_y at the ZrN grain interfaces.