Preparation of KTiOPO4 thin films on different substrates by pulsed laser deposition

Pulsed laser deposition (PLD) technique is applied in fabrication of thin films of KTiOPO₄ (KTP) material, which possesses electro-optic and nonlinear optical properties. Thin film fabrication of optically functional KTP on fused silica and different sapphire substrates by changing an ambient oxygen pressure and a substrate temperature during PLD is investigated. Highly oriented KTP thin films could be grown on sapphire $ {left( {11overline{2} 0} right)} $ in an oxygen atmosphere by PLD using a composite target whose stoichiometry is nearly same as KTP. Although the film contained polycrystalline crystallites, predominant crystallites seemed to be epitaxially grown.