| 一种高精度测量束斑电流的新方法 |
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| 引用本文： | 魏守水 陈振生. 一种高精度测量束斑电流的新方法[J]. 微细加工技术, 1999, 0(2): 8-11 |
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| 作者姓名： | 魏守水 陈振生 |
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| 作者单位： | 山东工业大学自动化系 |
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| 摘 要： | 提出了一种高精度测量电子束曝光机束流的新方法。并给出测量电路，该电路在未加屏蔽的情况下，可达９０ｄＢ的共模抑制比。
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| 关 键 词： | 电子束曝光机 A／D转换 束斑电流 测量 |
A NEW HIGH PRECISION MEASUREMENT TECHNIQUE OF BEAM SPOT CURRENT FOR EBEM |
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| Wei Shoushui,Chen Zhensheng,Zhao Chunmin,Zhang Yulin. A NEW HIGH PRECISION MEASUREMENT TECHNIQUE OF BEAM SPOT CURRENT FOR EBEM[J]. Microfabrication Technology, 1999, 0(2): 8-11 |
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| Authors: | Wei Shoushui Chen Zhensheng Zhao Chunmin Zhang Yulin |
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| Abstract: | A new technique tomeasure the current of electron beam of EBEM (Electron Beam Exposure Machine) with high Precision is Proposed. The circuit is described and its CMRR of 90dB is achieved without additional shielding. |
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| Keywords: | Electron beam exposure machine ADC |
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