激光直写系统制作掩模和器件的工艺

激光直写系统是国际上９０年代制作集成电路光刻掩模版的新型专用设备。微细加工光学技术国家重点实验室从加拿大引进了国内第一台激光直写系统。利用这台系统，通过高精度激光束在光致抗蚀剂上扫描曝光，将设计图形直接转移到掩模或硅片上。激光直写系统的应用，可以分成一次曝光制作光刻掩模和多次套刻曝光制作器件两个方面。介绍使用激光直写系统制作光刻掩模和套刻器件的具体工艺，并给出利用激光直写工艺做出的一些掩模和器件的实例

PROCESS OF MASK MAKING AND DEVICE MAKING WITH LASER DIRECT WRITE SYSTEM

Laser direct write system is a new type of special equipment for IC mask making in the nineties in the world.The State Key Laboratory of Optical Technology for Microfabrication imported the first laser direct write system into China from Canada.With this system,the patterns of any circuit design can be transferred onto a mask or wafer where the photoresist layer is exposed by scanning a high precision laser beam.Mask making with one step exposure and device making with multiple overlay exposure are applications of the system.The specific process of mask making and device making with the laser direct write system are introduced in the paper.Some mask and device patterns made by the laser direct write process are given.