| 亚微米分步重复投影光刻机总体设计考虑的几个问题 |
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| 引用本文： | 陈旭南.亚微米分步重复投影光刻机总体设计考虑的几个问题[J].微细加工技术,1999(1):25-30. |
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| 作者姓名： | 陈旭南 |
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| 作者单位： | 中国科学院光电技术研究所微细加工光学技术国家重点实验室 |
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| 摘 要： | 介绍对亚微米分步重复投影光刻机光刻工作分辨力、套刻和生产能力三项主要技术指标的设计分析，方案考虑以及采取的技术措施。测试结果表明这些考虑是必要并且有效的，它为光刻机的研制成功打下基础，也为设计下一代指标要求更高的光刻机提供有益的参考。
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| 关 键 词： | 光刻机设计 工作分辨力 套刻 生产能力 |
SEVERAL CONSIDERATIONS IN OVERALL DESIGN OF SUB MICRON STEPPER |
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| Chen Xunan.SEVERAL CONSIDERATIONS IN OVERALL DESIGN OF SUB MICRON STEPPER[J].Microfabrication Technology,1999(1):25-30. |
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| Authors: | Chen Xunan |
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| Abstract: | The analysis and design of three main specifications (resolution, overlay and throughput) and technology methods taken in the sub micron stepper are described . Test results show that those considerations are necessary and effective. They lay the foundations for the successful fabrication of the stepper and they are profitable references to the investigation of next generation stepper. |
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| Keywords: | design of stepper resolution overlay throughput |
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