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Proximity function calculation of patterns in positive electron resists
Authors:J. Brandt  J. H. Lai  L. T. Shepherd
Affiliation:(1) Honeywell Corporate Material Sciences Center, 55420 Bloomington, Minnesota
Abstract:Experiments have been performed to determine the accuracy of the proximity function model in predicting feature dimensions for two positive electron resists. The model parameters were determined from the linewidth versus dose relationship for single beam scans. A small systematic ‘overdevelopment’ error was found in the calculated patterns, which is attributed to the limitations of the model assumptions.
Keywords:Proximity function  proximity corrections  positive electron resists  electron beam lithography
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