| 离轴溅射法中最佳几何参量的预测 |
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| 引用本文： | 杜晓松,李杰,蒋亚东,谢光忠,李伟,王涛. 离轴溅射法中最佳几何参量的预测[J]. 真空, 2007, 44(3): 5-8 |
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| 作者姓名： | 杜晓松 李杰 蒋亚东 谢光忠 李伟 王涛 |
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| 作者单位： | 电子科技大学,电子薄膜与集成器件国家重点实验室,四川,成都,610054 |
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| 摘 要： | 为提高磁控溅射薄膜的厚度均匀性,采用理论计算的方法分析了离轴溅射薄膜的厚度分布,结果表明最佳偏心距及对应的有效薄膜尺寸都与靶基距呈线性增大的关系。溅射原子的角分布、溅射环的宽度以及膜厚均匀性要求都会影响该线性关系。针对以上变化因子,本文归纳出了普适的公式,可方便地对实际工作进行指导。
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| 关 键 词： | 膜厚均匀性 离轴溅射 普适公式 预测 |
| 文章编号： | 1002-0322（2007）03-0005-04 |
| 修稿时间： | 2006-10-09 |
Prediction on the optimal geometry for off-axis sputtering process |
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| DU Xiao-song,LI Jie,JIANG Ya-dong,XIE Guang-zhong,LI Wei,WANG Tao. Prediction on the optimal geometry for off-axis sputtering process[J]. Vacuum(China), 2007, 44(3): 5-8 |
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| Authors: | DU Xiao-song LI Jie JIANG Ya-dong XIE Guang-zhong LI Wei WANG Tao |
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| Affiliation: | State Key Lab of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China (UESTC |
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| Abstract: | To improve the thickness uniformity of thin films deposited by magnetron sputtering process,the substrate is rotated off its axis in relation to magnetron target.The thickness distribution of sputtered film is analyzed by theoretical calculation.The result shows that the optimal eccentricity(off-axis displacement)and the corresponding effective film size both linearly increase with the target-to-substrate distance.This linear relationship is affected by the angular distribution of the sputtered atoms,the width of the erosion rings and the requirement for thickness uniformity.A general formula is thus summarized,which can be directly applied to other off-axis sputtering apparatus to predict the optimal geometries. |
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| Keywords: | thickness uniformity off-axis sputtering general formula prediction |
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